JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Scope & Guideline

Pioneering Research in Condensed Matter Physics.

Introduction

Explore the comprehensive scope of JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A through our detailed guidelines, including its aims and scope. Stay updated with trending and emerging topics, and delve into declining areas to understand shifts in academic interest. Our guidelines also showcase highly cited topics, featuring influential research making a significant impact. Additionally, discover the latest published papers and those with high citation counts, offering a snapshot of current scholarly conversations. Use these guidelines to explore JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A in depth and align your research initiatives with current academic trends.
LanguageEnglish
ISSN0734-2101
PublisherA V S AMER INST PHYSICS
Support Open AccessNo
CountryUnited States
TypeJournal
Converge1970, from 1982 to 2024
AbbreviationJ VAC SCI TECHNOL A / J. Vac. Sci. Technol. A
Frequency6 issues/year
Time To First Decision-
Time To Acceptance-
Acceptance Rate-
Home Page-
AddressSTE 1 NO 1, 2 HUNTINGTON QUADRANGLE, MELVILLE, NY 11747-4502

Aims and Scopes

The Journal of Vacuum Science & Technology A focuses on the interdisciplinary aspects of vacuum science and technology, particularly in materials science, thin film deposition, surface science, and plasma processing. It publishes research that advances the understanding and application of vacuum technologies in various fields.
  1. Thin Film Deposition Techniques:
    Research focused on various methods of thin film deposition, including atomic layer deposition (ALD), chemical vapor deposition (CVD), and magnetron sputtering, emphasizing innovations in process stability, film quality, and application-specific outcomes.
  2. Surface and Interface Science:
    Studies investigating the properties and behaviors of surfaces and interfaces, including surface modification, material interactions, and the effects of processing conditions on surface characteristics.
  3. Plasma Processing and Characterization:
    Research exploring the role of plasma in material processing, including plasma-enhanced deposition techniques, etching processes, and the characterization of plasma properties to improve material performance.
  4. Materials Characterization Techniques:
    Development and application of advanced characterization techniques such as x-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), and ellipsometry to analyze thin films and nanostructures.
  5. Functional and Smart Materials:
    Exploration of new materials with specific functionalities, including smart coatings, photonic materials, and nanocomposites, aimed at enhancing performance in electronic, optical, and biomedical applications.
The Journal of Vacuum Science & Technology A has adapted to reflect contemporary advancements and interests in the field. This section outlines the trending and emerging themes that have gained traction in recent publications.
  1. Atomic Layer Deposition Innovations:
    Research on atomic layer deposition (ALD) continues to gain prominence, particularly in optimizing processes for new materials, enhancing selectivity, and developing novel precursors for improved film qualities.
  2. Integration of Machine Learning in Material Science:
    An increasing trend towards using machine learning and artificial intelligence to predict material properties, optimize deposition processes, and analyze complex datasets in materials research.
  3. Sustainable and Green Technologies:
    Growing interest in sustainable practices, including the development of environmentally friendly deposition processes and materials that minimize waste and energy consumption.
  4. Advanced Characterization Techniques:
    Emerging methods in materials characterization, such as in situ analysis and advanced spectroscopy techniques, are becoming more common as researchers seek to gain deeper insights into material behavior during processing.
  5. High-Performance Materials for Electronics:
    There is a rising focus on developing high-performance materials for electronic applications, including wide-bandgap semiconductors like β-Ga2O3, which are critical for next-generation electronic devices.

Declining or Waning

As the field of vacuum science and technology evolves, certain research themes have seen a decline in prominence. This section highlights these waning scopes, which may reflect shifts in focus or emerging priorities in the journal.
  1. Traditional Vacuum Technologies:
    Research related to conventional vacuum technologies has decreased, possibly due to a shift towards advanced materials and novel processing techniques that leverage modern capabilities.
  2. Older Surface Analysis Techniques:
    The use of older surface analysis techniques may be declining as researchers increasingly adopt more advanced methods that provide greater resolution and analysis capabilities, such as high-energy resolution spectroscopies.
  3. Basic Studies on Classical Thin Film Materials:
    There is a noticeable decline in basic research on classical thin film materials, such as simple metal or oxide films, as interest shifts towards complex, multi-component materials with tailored properties.

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