Journal of Micro-Nanopatterning Materials and Metrology-JM3

Scope & Guideline

Shaping Tomorrow's Technologies with Cutting-Edge Research

Introduction

Explore the comprehensive scope of Journal of Micro-Nanopatterning Materials and Metrology-JM3 through our detailed guidelines, including its aims and scope. Stay updated with trending and emerging topics, and delve into declining areas to understand shifts in academic interest. Our guidelines also showcase highly cited topics, featuring influential research making a significant impact. Additionally, discover the latest published papers and those with high citation counts, offering a snapshot of current scholarly conversations. Use these guidelines to explore Journal of Micro-Nanopatterning Materials and Metrology-JM3 in depth and align your research initiatives with current academic trends.
LanguageEnglish
ISSN1932-5150
PublisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Support Open AccessNo
CountryUnited States
TypeJournal
Convergefrom 2007 to 2024
AbbreviationJ MICRO-NANOPATTERN / J. Micro-Nanopatterning Mater. Metrol.-JM3
Frequency4 issues/year
Time To First Decision-
Time To Acceptance-
Acceptance Rate-
Home Page-
Address1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98225

Aims and Scopes

The Journal of Micro-Nanopatterning Materials and Metrology (JM3) is dedicated to advancing the field of micro and nano fabrication technologies, focusing on metrology, materials, and lithographic techniques. The journal covers a wide spectrum of topics critical to the semiconductor industry and related fields, aiming to provide a platform for innovative research and development in lithography and measurement techniques.
  1. Lithography Techniques:
    The journal emphasizes various lithography methods including photolithography, electron beam lithography, and nanoimprint lithography. Research in this area focuses on improving resolution, throughput, and defect reduction.
  2. Metrology Innovations:
    A core focus is on developing and refining metrology techniques for measuring critical dimensions, overlay accuracy, and defect detection in semiconductor manufacturing. This includes advanced imaging and measurement techniques.
  3. Material Development:
    The journal covers studies on new materials for lithography, including photoresists and mask materials, with an emphasis on chemical formulations and their performance in extreme ultraviolet (EUV) lithography.
  4. Computational Approaches and Machine Learning:
    There is a growing body of work on computational modeling and machine learning applications aimed at optimizing lithographic processes and improving defect detection and characterization.
  5. Advanced Packaging Technologies:
    Research related to advanced packaging solutions, such as panel-level packaging and integration of micro and nano devices, is increasingly featured, reflecting industry trends towards miniaturization and enhanced performance.
The journal has identified several emerging themes and trends that are gaining traction, reflecting advancements in technology and the evolving needs of the semiconductor industry. These trends indicate a shift towards more integrated, efficient, and advanced methodologies.
  1. Curvilinear Mask Technologies:
    Research into curvilinear mask design and metrology is on the rise, addressing the challenges posed by complex geometries in modern semiconductor devices and enhancing performance in advanced lithography.
  2. Machine Learning Applications:
    There is a notable increase in the application of machine learning techniques for optimizing lithography processes, defect detection, and metrology, demonstrating the potential of AI in semiconductor manufacturing.
  3. EUV Lithography Advances:
    With the ongoing deployment of EUV lithography in production, research focused on improving EUV materials, processes, and metrology techniques is trending, highlighting its critical role in future semiconductor manufacturing.
  4. Panel-Level Packaging Innovations:
    As the demand for advanced packaging solutions increases, research on panel-level packaging and integration technologies is emerging, reflecting industry trends towards miniaturization and performance enhancement.
  5. 3D and Multi-dimensional Metrology:
    Emerging themes in three-dimensional metrology techniques are gaining attention, with a focus on improving accuracy and precision in measuring complex structures in semiconductor devices.

Declining or Waning

While the journal continues to cover a broad range of topics, certain themes appear to be declining in prominence based on recent publications. This may reflect shifts in industry focus or advancements in technology rendering some approaches less relevant.
  1. Traditional Optical Lithography:
    As the industry moves towards extreme ultraviolet (EUV) and other advanced lithography techniques, traditional optical lithography methods appear less frequently in newer publications.
  2. Single Patterning Techniques:
    Research on single patterning techniques is becoming less common, as the industry increasingly adopts multi-patterning approaches to meet the demands of smaller feature sizes.
  3. Basic Resist Chemistry:
    While foundational studies in resist chemistry were prominent in earlier years, recent publications suggest a shift towards more application-focused research, potentially reducing the emphasis on fundamental resist chemistry.
  4. General Reviews on Historical Techniques:
    There seems to be a waning interest in broad reviews of older lithographic techniques, as the focus shifts to novel and emerging technologies that are more relevant to current industry challenges.

Similar Journals

Nondestructive Testing and Evaluation

Innovative Insights for Safer Structures and Materials
Publisher: TAYLOR & FRANCIS LTDISSN: 1058-9759Frequency: 8 issues/year

Nondestructive Testing and Evaluation, published by Taylor & Francis Ltd, is a premier international journal dedicated to the dissemination of innovative research and practices in the field of nondestructive testing and evaluation. With a robust ISSN of 1058-9759 and an E-ISSN of 1477-2671, this journal has consistently served as a vital resource for researchers, professionals, and students interested in enhancing the safety and reliability of materials and structures through advanced testing techniques. The journal's significant impact, evidenced by its Q2 rankings across multiple categories—including Materials Science, Mechanical Engineering, and Physics and Astronomy, along with commendable Scopus rankings—reflects its commitment to high-quality scholarship. Covering the convergence of research from 1989 to 2024, Nondestructive Testing and Evaluation plays a crucial role in advancing methodologies that drive innovation in various engineering disciplines. While currently not offering an Open Access option, the journal remains a respected platform for exchanging knowledge that shapes the future of nondestructive methodologies.

Microsystems & Nanoengineering

Pioneering Research for a Smaller, Smarter Future
Publisher: SPRINGERNATUREISSN: 2055-7434Frequency: 1 issue/year

Microsystems & Nanoengineering, published by SpringerNature, stands at the forefront of advancing knowledge in the fields of atomic and molecular physics, condensed matter physics, electrical and electronic engineering, and materials science. With an impressive impact factor and categorized in Q1 across multiple prestigious fields in 2023, this journal not only provides a platform for high-quality research but also reflects the vitality of innovations within these disciplines. Since its transition to Open Access in 2015, it has significantly broadened accessibility for researchers, professionals, and students globally, facilitating the dissemination of groundbreaking findings. Addressed in the United Kingdom, with a focus on interdisciplinary collaboration, Microsystems & Nanoengineering aims to foster connections between theoretical advancements and practical applications, serving as a crucial resource for those engaged in cutting-edge nanoscale technologies and microsystems development. Immerse yourself in the latest studies and engage with the vibrant community that shapes the future of science and engineering.

IRONMAKING & STEELMAKING

Shaping Tomorrow’s Steel: A Journal of Innovation
Publisher: SAGE PUBLICATIONS INCISSN: 0301-9233Frequency: 10 issues/year

IRONMAKING & STEELMAKING is a premier peer-reviewed journal published by SAGE Publications Inc, dedicated to advancing the field of metallurgical engineering and materials science. With a notable ISSN of 0301-9233 and an E-ISSN of 1743-2812, this journal has established itself as a significant platform for disseminating high-quality research on ironmaking processes, steel production, and associated technologies. Covering a broad scope of topics, it is indexed in the top quartiles (Q2) in Materials Chemistry, Mechanical Engineering, Mechanics of Materials, and Metals and Alloys for 2023, underscoring its pivotal role in these disciplines. Since its inception in 1974 and continuing through 2024, IRONMAKING & STEELMAKING attracts a global audience of researchers, professionals, and students, contributing valuable insights and innovations in the field. Although not an open-access publication, subscribers can access essential findings that shape the future of metallurgy and steelmaking. This journal not only serves as a repository of knowledge but also as a beacon for ongoing research and technological advancement, making it a must-read for those passionate about materials science.

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

Illuminating the future of electronics through rigorous research.
Publisher: SPRINGER HEIDELBERGISSN: 0946-7076Frequency: 12 issues/year

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS is an esteemed scholarly journal published by SPRINGER HEIDELBERG, bringing together cutting-edge research in the fields of microsystems and nanosystems, with a specific focus on information storage and processing technologies. With its origins tracing back to 1994, this journal has established a solid reputation within the academic community and currently ranks in Q3 across key disciplines, including Condensed Matter Physics and Electrical and Electronic Engineering, as assessed by the 2023 category quartiles. The journal is notable for its contribution to advancing knowledge in Nanoscience and Materials Science, particularly in the domains of electronic, optical, and magnetic materials. As a pivotal resource for researchers, professionals, and students alike, it offers insights into innovative methodologies, applications, and breakthroughs in microsystems technologies that are shaping the future of electronics and computing. While currently not an open-access journal, it maintains a commitment to disseminating significant findings in the rapidly evolving landscape of information processing systems, fostering collaboration and knowledge exchange within the scientific community.

JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY

Empowering Research with Open Access Excellence.
Publisher: NATL INST STANDARDS & TECHNOLOGY-NISTISSN: 1044-677XFrequency: 1 issue/year

Welcome to the Journal of Research of the National Institute of Standards and Technology, published by the National Institute of Standards and Technology (NIST). This esteemed journal, identifiable by its ISSN 1044-677X and E-ISSN 2165-7254, serves as a critical platform for disseminating valuable research in the field of engineering, particularly with its focus on standards and technology applications. Operating as an Open Access journal since 2012, it ensures that all published works are freely accessible, fostering greater collaboration and advancement within the scientific community. Despite its coverage discontinuation in Scopus, the journal maintains a respectable Q3 quartile ranking in Engineering (Miscellaneous), with a Scopus rank of 118 out of 302, placing it within the 61st percentile. Based in Gaithersburg, Maryland, this publication not only supports the research ecosystem but also contributes significantly to advancing knowledge and practices in measuring and standards, making it an indispensable resource for researchers, professionals, and students engaged in related fields.

Micro and Nano Engineering

Catalyzing collaboration in cutting-edge research.
Publisher: ELSEVIERISSN: Frequency: 4 issues/year

Micro and Nano Engineering, published by ELSEVIER, is a premier open-access journal dedicated to advancing the fields of atomic and molecular physics, condensed matter physics, as well as electrical and electronic engineering. With an E-ISSN of 2590-0072, the journal has established itself as an influential platform for the dissemination of cutting-edge research and innovative methodologies in micro- and nano-scale technologies since its inception in 2018. The journal proudly holds a Q2 category ranking in several discipline-specific quartiles for the year 2023, including Atomic and Molecular Physics, highlighting its significance in the academic community. Located in Amsterdam, Netherlands, Micro and Nano Engineering offers researchers and practitioners a unique opportunity to publish their work and gain visibility through its rigorous peer-review process and high-quality editorial standards. The open-access model ensures that research findings are accessible to a global audience, fostering collaborative advancements and ongoing discourse within these dynamic fields. Whether you are a researcher, professional, or student, Micro and Nano Engineering is your go-to source for pivotal developments in nanotechnology and engineering applications.

PACKAGING TECHNOLOGY AND SCIENCE

Transforming Ideas into Innovative Packaging Solutions
Publisher: WILEYISSN: 0894-3214Frequency: 12 issues/year

PACKAGING TECHNOLOGY AND SCIENCE, published by Wiley, is a leading journal in the fields of packaging technology, materials science, and mechanical engineering. With a dedicated focus on innovative research and advancements in packaging materials and methodologies, the journal has made significant contributions since its inception in 1988. It holds a distinguished position as a Q2 journal in multiple disciplines, including Chemistry, Materials Science, and Mechanical Engineering, reflecting its high impact and scholarly influence. Although not an Open Access publication, it reaches a broad audience through its rigorous peer-review process and commitment to disseminating critical findings in packaging research. Researchers, professionals, and students alike benefit from the journal’s rich content that encourages interdisciplinary collaboration and the exploration of sustainable packaging solutions. For those seeking to remain at the forefront of packaging technology and science, this journal serves as an essential resource for fostering innovation and addressing the evolving challenges within the industry.

Surface Topography-Metrology and Properties

Unveiling the secrets of surfaces for technological advancement.
Publisher: IOP Publishing LtdISSN: 2051-672XFrequency: 4 issues/year

Surface Topography-Metrology and Properties is an esteemed journal published by IOP Publishing Ltd, dedicated to advancing the field of surface metrology and its interrelation with material properties. With an ISSN of 2051-672X, this journal serves as a pivotal platform for researchers, professionals, and students engaged in the study of surfaces and coatings, particularly in disciplines such as Instrumentation, Materials Chemistry, and Process Chemistry and Technology. The journal maintains a strong academic presence with notable Category Quartile rankings, including Q2 in Materials Chemistry and Surfaces, Coatings and Films, and Q3 in other relevant fields. Although the journal operates under a subscription model, it offers valuable insights and findings that are crucial for advancing technologies reliant on surface characteristics and functionalities. Since its inception in 2013, the journal has continued to publish high-quality research up to the present day, catering to the ongoing needs of the scientific community and contributing significantly to the discourse in surface science.

Optica

Breaking barriers in optical research and knowledge sharing.
Publisher: Optica Publishing GroupISSN: 2334-2536Frequency: 12 issues/year

Optica is a premier open-access journal published by the Optica Publishing Group, designed to disseminate high-quality research across the fields of Atomic and Molecular Physics and Optics. Since its inception in 2014, it has established itself as a vital resource for the scientific community, as evidenced by its impressive Q1 rankings in both relevant categories in 2023 and its notable positions in the Scopus rankings—#9 in Atomic and Molecular Physics and #13 in Materials Science. Featuring cutting-edge research from leading experts, Optica aims to foster innovation and collaboration by providing unrestricted access to groundbreaking discoveries and advancements. Researchers, professionals, and students alike will find invaluable insights and trends that drive the ever-evolving scope of optical science and materials technology. With its commitment to open access, Optica ensures that knowledge is accessible, empowering the global community of scientists and researchers to embark on new explorations.

Micro and Nano Systems Letters

Exploring the Future of Biomaterials and Engineering
Publisher: SPRINGERNATUREISSN: Frequency: 1 issue/year

Micro and Nano Systems Letters, published by SPRINGERNATURE, is a prominent peer-reviewed journal dedicated to advancing the field of micro and nanosystems, with a special focus on biomaterials and biomedical engineering. Since its inception in 2013, this Open Access journal has provided a vital platform for researchers and practitioners to disseminate innovative findings and share insights that contribute to the growing body of knowledge in these rapidly evolving disciplines. With a remarkable impact reflected in its Q1 quartile rankings in both biomaterials and biomedical engineering, and impressive Scopus ranks placing it within the top tier of its fields, Micro and Nano Systems Letters plays a critical role in fostering collaboration and knowledge exchange among scientists and engineers worldwide. The journal is accessible globally, ensuring that research is widely disseminated and impacting a diverse audience to drive progress in technology and healthcare solutions.