Journal of Micro-Nanopatterning Materials and Metrology-JM3

Scope & Guideline

Innovating Materials Science Through Precision and Insight

Introduction

Welcome to the Journal of Micro-Nanopatterning Materials and Metrology-JM3 information hub, where our guidelines provide a wealth of knowledge about the journal’s focus and academic contributions. This page includes an extensive look at the aims and scope of Journal of Micro-Nanopatterning Materials and Metrology-JM3, highlighting trending and emerging areas of study. We also examine declining topics to offer insight into academic interest shifts. Our curated list of highly cited topics and recent publications is part of our effort to guide scholars, using these guidelines to stay ahead in their research endeavors.
LanguageEnglish
ISSN1932-5150
PublisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
Support Open AccessNo
CountryUnited States
TypeJournal
Convergefrom 2007 to 2024
AbbreviationJ MICRO-NANOPATTERN / J. Micro-Nanopatterning Mater. Metrol.-JM3
Frequency4 issues/year
Time To First Decision-
Time To Acceptance-
Acceptance Rate-
Home Page-
Address1000 20TH ST, PO BOX 10, BELLINGHAM, WA 98225

Aims and Scopes

The Journal of Micro-Nanopatterning Materials and Metrology (JM3) is dedicated to advancing the field of micro and nano fabrication technologies, focusing on metrology, materials, and lithographic techniques. The journal covers a wide spectrum of topics critical to the semiconductor industry and related fields, aiming to provide a platform for innovative research and development in lithography and measurement techniques.
  1. Lithography Techniques:
    The journal emphasizes various lithography methods including photolithography, electron beam lithography, and nanoimprint lithography. Research in this area focuses on improving resolution, throughput, and defect reduction.
  2. Metrology Innovations:
    A core focus is on developing and refining metrology techniques for measuring critical dimensions, overlay accuracy, and defect detection in semiconductor manufacturing. This includes advanced imaging and measurement techniques.
  3. Material Development:
    The journal covers studies on new materials for lithography, including photoresists and mask materials, with an emphasis on chemical formulations and their performance in extreme ultraviolet (EUV) lithography.
  4. Computational Approaches and Machine Learning:
    There is a growing body of work on computational modeling and machine learning applications aimed at optimizing lithographic processes and improving defect detection and characterization.
  5. Advanced Packaging Technologies:
    Research related to advanced packaging solutions, such as panel-level packaging and integration of micro and nano devices, is increasingly featured, reflecting industry trends towards miniaturization and enhanced performance.
The journal has identified several emerging themes and trends that are gaining traction, reflecting advancements in technology and the evolving needs of the semiconductor industry. These trends indicate a shift towards more integrated, efficient, and advanced methodologies.
  1. Curvilinear Mask Technologies:
    Research into curvilinear mask design and metrology is on the rise, addressing the challenges posed by complex geometries in modern semiconductor devices and enhancing performance in advanced lithography.
  2. Machine Learning Applications:
    There is a notable increase in the application of machine learning techniques for optimizing lithography processes, defect detection, and metrology, demonstrating the potential of AI in semiconductor manufacturing.
  3. EUV Lithography Advances:
    With the ongoing deployment of EUV lithography in production, research focused on improving EUV materials, processes, and metrology techniques is trending, highlighting its critical role in future semiconductor manufacturing.
  4. Panel-Level Packaging Innovations:
    As the demand for advanced packaging solutions increases, research on panel-level packaging and integration technologies is emerging, reflecting industry trends towards miniaturization and performance enhancement.
  5. 3D and Multi-dimensional Metrology:
    Emerging themes in three-dimensional metrology techniques are gaining attention, with a focus on improving accuracy and precision in measuring complex structures in semiconductor devices.

Declining or Waning

While the journal continues to cover a broad range of topics, certain themes appear to be declining in prominence based on recent publications. This may reflect shifts in industry focus or advancements in technology rendering some approaches less relevant.
  1. Traditional Optical Lithography:
    As the industry moves towards extreme ultraviolet (EUV) and other advanced lithography techniques, traditional optical lithography methods appear less frequently in newer publications.
  2. Single Patterning Techniques:
    Research on single patterning techniques is becoming less common, as the industry increasingly adopts multi-patterning approaches to meet the demands of smaller feature sizes.
  3. Basic Resist Chemistry:
    While foundational studies in resist chemistry were prominent in earlier years, recent publications suggest a shift towards more application-focused research, potentially reducing the emphasis on fundamental resist chemistry.
  4. General Reviews on Historical Techniques:
    There seems to be a waning interest in broad reviews of older lithographic techniques, as the focus shifts to novel and emerging technologies that are more relevant to current industry challenges.

Similar Journals

JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY

Pioneering Innovations in Engineering and Technology.
Publisher: NATL INST STANDARDS & TECHNOLOGY-NISTISSN: 1044-677XFrequency: 1 issue/year

Welcome to the Journal of Research of the National Institute of Standards and Technology, published by the National Institute of Standards and Technology (NIST). This esteemed journal, identifiable by its ISSN 1044-677X and E-ISSN 2165-7254, serves as a critical platform for disseminating valuable research in the field of engineering, particularly with its focus on standards and technology applications. Operating as an Open Access journal since 2012, it ensures that all published works are freely accessible, fostering greater collaboration and advancement within the scientific community. Despite its coverage discontinuation in Scopus, the journal maintains a respectable Q3 quartile ranking in Engineering (Miscellaneous), with a Scopus rank of 118 out of 302, placing it within the 61st percentile. Based in Gaithersburg, Maryland, this publication not only supports the research ecosystem but also contributes significantly to advancing knowledge and practices in measuring and standards, making it an indispensable resource for researchers, professionals, and students engaged in related fields.

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS

Advancing the frontiers of microsystems and nanosystems.
Publisher: SPRINGER HEIDELBERGISSN: 0946-7076Frequency: 12 issues/year

MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS is an esteemed scholarly journal published by SPRINGER HEIDELBERG, bringing together cutting-edge research in the fields of microsystems and nanosystems, with a specific focus on information storage and processing technologies. With its origins tracing back to 1994, this journal has established a solid reputation within the academic community and currently ranks in Q3 across key disciplines, including Condensed Matter Physics and Electrical and Electronic Engineering, as assessed by the 2023 category quartiles. The journal is notable for its contribution to advancing knowledge in Nanoscience and Materials Science, particularly in the domains of electronic, optical, and magnetic materials. As a pivotal resource for researchers, professionals, and students alike, it offers insights into innovative methodologies, applications, and breakthroughs in microsystems technologies that are shaping the future of electronics and computing. While currently not an open-access journal, it maintains a commitment to disseminating significant findings in the rapidly evolving landscape of information processing systems, fostering collaboration and knowledge exchange within the scientific community.

METROLOGIA

Elevating Engineering Standards Through Metrology Research
Publisher: IOP Publishing LtdISSN: 0026-1394Frequency: 6 issues/year

METROLOGIA is a premier journal published by IOP Publishing Ltd, dedicated to the field of metrology and its related disciplines. Established in 1965, it has served as a vital platform for disseminating high-quality research and advancements in measurement science, fostering innovation in engineering applications. The journal holds a notable Q2 ranking in the Engineering (miscellaneous) category and ranks #128 out of 307 in the general engineering category according to Scopus, placing it in the 58th percentile among its peers. Its impact within the academic community is underscored by its comprehensive scope, which covers theoretical developments, methods, and practical applications in metrology. Researchers, professionals, and students are encouraged to explore its rich repository of literature, which aims to promote understanding and collaboration across various engineering fields. With its continuous publication until 2024, METROLOGIA remains an essential resource for those seeking to stay at the forefront of measurement technologies and methodologies.

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES

Exploring Cutting-Edge Methodologies in Physics and Engineering
Publisher: MAIK NAUKA/INTERPERIODICA/SPRINGERISSN: 0020-4412Frequency: 6 issues/year

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES is a renowned academic journal dedicated to the field of instrumentation and experimental methodologies within physics and engineering. Published by MAIK NAUKA/INTERPERIODICA/SPRINGER, this journal serves as a vital platform for disseminating innovative research findings, detailed experimental techniques, and advancements in instrumentation technologies. Operating since its inception in 1968, it has established itself as a reputable source for scholars and industry professionals, though it currently holds a category quartile ranking of Q4 in Instrumentation based on the 2023 metrics. With an ISSN of 0020-4412 for print and E-ISSN of 1608-3180 for electronic formats, the journal is accessible to a global audience, offering crucial insights that can lead to significant advancements in experimental approaches across various scientific domains. Despite a current Scopus ranking placing it in the lower percentile, the journal continues to contribute to the ongoing discussions and developments in instrumentation, making it an essential read for researchers, professionals, and students eager to enhance their knowledge and expertise in this specialized area.

Surface Topography-Metrology and Properties

Exploring the intricate relationship between surfaces and material properties.
Publisher: IOP Publishing LtdISSN: 2051-672XFrequency: 4 issues/year

Surface Topography-Metrology and Properties is an esteemed journal published by IOP Publishing Ltd, dedicated to advancing the field of surface metrology and its interrelation with material properties. With an ISSN of 2051-672X, this journal serves as a pivotal platform for researchers, professionals, and students engaged in the study of surfaces and coatings, particularly in disciplines such as Instrumentation, Materials Chemistry, and Process Chemistry and Technology. The journal maintains a strong academic presence with notable Category Quartile rankings, including Q2 in Materials Chemistry and Surfaces, Coatings and Films, and Q3 in other relevant fields. Although the journal operates under a subscription model, it offers valuable insights and findings that are crucial for advancing technologies reliant on surface characteristics and functionalities. Since its inception in 2013, the journal has continued to publish high-quality research up to the present day, catering to the ongoing needs of the scientific community and contributing significantly to the discourse in surface science.

ULTRAMICROSCOPY

Transforming Research through Cutting-Edge Microscopy Advances
Publisher: ELSEVIERISSN: 0304-3991Frequency: 12 issues/year

ULTRAMICROSCOPY is a premier journal published by Elsevier, specializing in the fields of atomic and molecular physics, optics, as well as electronic, optical, and magnetic materials. Established in 1975 and continuing its publication through 2024, this journal has earned a distinguished reputation, reflected in its classification within Q1 and Q2 quartiles, representing the top 25% of journals in its category. With a Scopus rank of 49 out of 141 in the instrumentation domain, it holds a compelling percentile rank of 65%, demonstrating its impact and relevance in advancing research. The journal serves as an essential platform for researchers, professionals, and students alike, promoting high-quality, peer-reviewed articles that explore innovative techniques and applications in microscopy. While ULTRAMICROSCOPY is not open access, it continues to play a crucial role in disseminating cutting-edge findings to the scientific community globally, fostering collaboration and discussion among experts in the field.

MAPAN-Journal of Metrology Society of India

Fostering a community dedicated to accuracy and excellence.
Publisher: METROLOGY SOC INDIAISSN: 0970-3950Frequency: 4 issues/year

MAPAN - Journal of Metrology Society of India, published by the Metrology Society of India, is a premier academic journal dedicated to the field of metrology, encompassing a diverse range of topics within physics and astronomy. With an ISSN of 0970-3950 and an E-ISSN of 0974-9853, this journal has established a solid reputation since its inception in 2009, converging into contemporary insights and practices through 2024. Achieving a commendable Q3 ranking in the 2023 Scopus categories, it sits confidently within the field's landscape, ranked 40 out of 81 and placing within the 51st percentile. Despite its accessible nature, the journal does not currently offer open access. MAPAN aims to disseminate cutting-edge research and innovations in metrology, supporting a vibrant community of researchers, professionals, and students striving to explore the precise measurements and standards crucial for advancements in science and technology. As it continues to foster scholarly exchange, MAPAN plays a significant role in elevating metrology research and influencing its application within various scientific disciplines.

NUKLEONIKA

Leading the Charge in Open Access Scientific Inquiry
Publisher: SCIENDOISSN: 0029-5922Frequency: 4 issues/year

NUKLEONIKA, published by SCIENDO, is a leading open access journal that has been serving the scientific community since its establishment in 1968. Focused on the domains of Nuclear and High Energy Physics, Condensed Matter Physics, and Nuclear Energy and Engineering, this journal provides a platform for innovative research and technological advancements in a variety of interdisciplinary fields. With an impressive history of publications and a current Q3 ranking in several categories, including Safety, Risk, Reliability and Quality and Waste Management and Disposal, NUKLEONIKA is recognized for its significant contributions to scientific discourse. Open access since 2014, the journal ensures that all research outputs are freely available, facilitating broad dissemination and accessibility for researchers, professionals, and students alike. Located in the heart of Warsaw, Poland, NUKLEONIKA aims to inspire collaborative efforts and foster a deeper understanding of complex physical phenomena and their practical implications.

Micro and Nano Systems Letters

Connecting Ideas, Transforming Healthcare
Publisher: SPRINGERNATUREISSN: Frequency: 1 issue/year

Micro and Nano Systems Letters, published by SPRINGERNATURE, is a prominent peer-reviewed journal dedicated to advancing the field of micro and nanosystems, with a special focus on biomaterials and biomedical engineering. Since its inception in 2013, this Open Access journal has provided a vital platform for researchers and practitioners to disseminate innovative findings and share insights that contribute to the growing body of knowledge in these rapidly evolving disciplines. With a remarkable impact reflected in its Q1 quartile rankings in both biomaterials and biomedical engineering, and impressive Scopus ranks placing it within the top tier of its fields, Micro and Nano Systems Letters plays a critical role in fostering collaboration and knowledge exchange among scientists and engineers worldwide. The journal is accessible globally, ensuring that research is widely disseminated and impacting a diverse audience to drive progress in technology and healthcare solutions.

Virtual and Physical Prototyping

Innovating Design Through Cutting-edge Research
Publisher: TAYLOR & FRANCIS LTDISSN: 1745-2759Frequency: 4 issues/year

Virtual and Physical Prototyping is a premier scholarly journal published by Taylor & Francis Ltd, which has established itself as a leading platform for innovative research in the fields of Computer Graphics, Computer-Aided Design, Industrial and Manufacturing Engineering, Modeling and Simulation, and Signal Processing. Since its inception in 2006, the journal has gained significant recognition, currently ranked in the Q1 quartile in multiple categories, reflecting its high impact and rigorous standards of scholarship. Now an Open Access journal as of 2023, it provides a unique opportunity for researchers, professionals, and students to share their work widely and engage with a global audience. With its strategic emphasis on the convergence of virtual and physical prototyping technologies, this journal contributes vital knowledge and insights that drive innovation and development in manufacturing processes and design methodologies. Located in the United Kingdom, its comprehensive approach to both theoretical and practical aspects of prototyping ensures that it remains an essential resource for advancing the respective fields it represents.