PLASMA CHEMISTRY AND PLASMA PROCESSING

metrics 2024

Exploring the Frontiers of Plasma Innovation

Introduction

PLASMA CHEMISTRY AND PLASMA PROCESSING, published by SPRINGER, is a premier journal dedicated to advancing the field of plasma chemistry and its applications in processing technologies. Established in 1981, this journal has attained a strong impact in its field, reflecting its Q2 rankings in several categories including Chemical Engineering, Chemistry, and Condensed Matter Physics. It serves as a crucial platform for researchers, professionals, and students aiming to explore innovative plasma-based techniques and solutions for diverse applications, including materials synthesis and surface engineering. Through rigorous peer-reviewed articles and comprehensive studies, this journal underscores the significance of plasma processes in contemporary scientific and industrial landscapes, fostering knowledge exchange and emerging trends up to the year 2024. With its strategic focus on cutting-edge research, PLASMA CHEMISTRY AND PLASMA PROCESSING remains an essential resource for those committed to the enhancement and evolution of plasma technologies.

Metrics 2024

SCIMAGO Journal Rank0.48
Journal Impact Factor2.60
Journal Impact Factor (5 years)2.90
H-Index81
Journal IF Without Self2.60
Eigen Factor0.00
Normal Eigen Factor0.39
Influence0.49
Immediacy Index0.80
Cited Half Life8.90
Citing Half Life7.90
JCI0.65
Total Documents1703
WOS Total Citations4091
SCIMAGO Total Citations11367
SCIMAGO SELF Citations1119
Scopus Journal Rank0.48
Cites / Document (2 Years)2.81
Cites / Document (3 Years)3.09
Cites / Document (4 Years)3.27

Metrics History

Rank 2024

Scopus

Condensed Matter Physics in Physics and Astronomy
Rank #108/434
Percentile 75.12
Quartile Q1
Surfaces, Coatings and Films in Materials Science
Rank #34/132
Percentile 74.24
Quartile Q2
General Chemical Engineering in Chemical Engineering
Rank #79/273
Percentile 71.06
Quartile Q2
General Chemistry in Chemistry
Rank #119/408
Percentile 70.83
Quartile Q2

IF (Web Of Science)

ENGINEERING, CHEMICAL
Rank 91/170
Percentile 46.80
Quartile Q3
PHYSICS, APPLIED
Rank 81/179
Percentile 55.00
Quartile Q2
PHYSICS, FLUIDS & PLASMAS
Rank 12/40
Percentile 71.30
Quartile Q2

JCI (Web Of Science)

ENGINEERING, CHEMICAL
Rank 55/171
Percentile 67.84
Quartile Q2
PHYSICS, APPLIED
Rank 69/179
Percentile 61.45
Quartile Q2
PHYSICS, FLUIDS & PLASMAS
Rank 17/40
Percentile 57.50
Quartile Q2

Quartile History

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