Journal of Chemical Metrology is a vital resource in the evolving fields of Analytical Chemistry, Electrochemistry, Spectroscopy, and Toxicology, published by ACG PUBLICATIONS in Turkey. With a focus on advancing the understanding and application of chemical metrology, this journal aims to bridge gaps in quantitative analysis, offering researchers and professionals a platform to disseminate groundbreaking studies and methodologies. Although it operates under a traditional access model, readers can benefit from its insights as the journal continues to gain recognition with its 2023 rankings placing it in the Q3 and Q4 categories across various scientific disciplines. From its inception in 2019 to its projected convergence in 2024, the journal has been instrumental in fostering collaboration and innovation in chemical sciences, making it an essential tool for students and researchers dedicated to enhancing analytical techniques and ensuring safety through effective toxicological assessments.

Journal of Micro-Nanopatterning Materials and Metrology (JM3), published by SPIE - The International Society for Optics and Photonics, is a premier forum for advancing knowledge within the realms of micro-nanopatterning and metrology. With an ISSN of 1932-5150 and an E-ISSN of 2708-8340, JM3 has established itself as a valuable resource since its inception in 2007, converging critical research toward 2024. The journal has recently achieved recognition in various scientific domains, holding a Q3 category in fields such as Atomic and Molecular Physics, Condensed Matter Physics, and Nanoscience, while also being placed in Q2 for Mechanical Engineering in 2023. Given its multifaceted focus, JM3 engages a wide audience, including engineers, physicists, and materials scientists, facilitating a dialogue that bridges theoretical and practical innovations. Open access options enable broader dissemination of research findings, enhancing visibility and impact. By continually striving to publish cutting-edge research and methodologies, JM3 plays a crucial role in shaping the future of material sciences and engineering practices.

Surface Topography-Metrology and Properties is an esteemed journal published by IOP Publishing Ltd, dedicated to advancing the field of surface metrology and its interrelation with material properties. With an ISSN of 2051-672X, this journal serves as a pivotal platform for researchers, professionals, and students engaged in the study of surfaces and coatings, particularly in disciplines such as Instrumentation, Materials Chemistry, and Process Chemistry and Technology. The journal maintains a strong academic presence with notable Category Quartile rankings, including Q2 in Materials Chemistry and Surfaces, Coatings and Films, and Q3 in other relevant fields. Although the journal operates under a subscription model, it offers valuable insights and findings that are crucial for advancing technologies reliant on surface characteristics and functionalities. Since its inception in 2013, the journal has continued to publish high-quality research up to the present day, catering to the ongoing needs of the scientific community and contributing significantly to the discourse in surface science.

Applied Psychological Measurement is a leading journal in the field of psychology and social sciences, published by SAGE Publications Inc. since its inception in 1977. With an impressive 2023 impact factor and consistently ranking in the Q1 quartile for both Psychology and Social Sciences categories, this journal plays a pivotal role in disseminating high-quality research that advances the understanding of psychological assessment and measurement methodologies. The journal embraces a diverse array of research contributions, ranging from empirical studies to theoretical discussions, covering critical topics that affect practitioners and researchers alike. With its comprehensive scope and rigorous peer-review process, Applied Psychological Measurement serves as an essential resource for researchers, professionals, and students aiming to deepen their knowledge and application of psychological measurement within various social contexts. The journal is based in the United States, ensuring a prominent platform for international discourse.

ACTA OPTICA SINICA is a distinguished journal dedicated to the field of optics and photonics, published by the Chinese Laser Press. With an ISSN of 0253-2239, this journal has been an essential resource since its inception, covering significant discoveries and advancements in atomic and molecular physics, electronic materials, and optical sciences. The journal is indexed in Scopus, achieving respectable ranks as Q3 in both Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, reflecting its engagement with current research trends. Although it is not an open-access journal, ACTA OPTICA SINICA is hosted from Shanghai, China, and continues to serve as a vital platform for researchers, professionals, and students alike to disseminate and access high-quality peer-reviewed articles, ensuring its prominent place in the academic discourse related to optics and material sciences.

FLOW MEASUREMENT AND INSTRUMENTATION, published by Elsevier Science Ltd, serves as a vital resource for researchers and professionals in the fields of Instrumentation, Electrical and Electronic Engineering, Computer Science Applications, and Modeling and Simulation. With an impressive trajectory since its inception in 1989 and extending to 2024, this journal has gained a notable reputation, ranking in the upper quartiles of various categories within the 2023 Scopus metrics, reflecting its significant contribution to advancing knowledge in flow measurement technologies and methodologies. Although it does not offer Open Access options, the journal is well-regarded for its rigorous peer-review process, ensuring high-quality, impactful research dissemination. The journal's emphasis on empirical studies and innovative instrument design establishes it as an essential platform for disseminating cutting-edge findings that facilitate practical applications and inform future research directions. Positioned within the United Kingdom, it attracts a global readership dedicated to the continuous enhancement of measurement sciences and engineering innovations.

tm-Technisches Messen is a reputable academic journal published by WALTER DE GRUYTER GMBH, focusing on the field of engineering, specifically in Electrical and Electronic Engineering and Instrumentation. With a rich history dating back to 1931, this journal serves as a critical platform for disseminating research, innovations, and developments relevant to measurement and instrumentation technologies. Despite its current quartile rankings of Q3 in Electrical and Electronic Engineering and Q4 in Instrumentation for 2023, the journal continues to attract submissions from leading researchers, offering insights that drive advancements within these fields. Researchers and practitioners can access a wealth of knowledge through this publication, fostering collaboration and sparking new ideas. Located in Berlin, Germany, the journal operates without an open-access model, making it essential for universities and institutions to play an integral role in supporting their library access to this valuable resource. As the journal continues to evolve through 2024 and beyond, it remains a significant contributor to the global discourse in measurement technologies, making it a must-read for anyone involved in these dynamic areas of study.

MAPAN - Journal of Metrology Society of India, published by the Metrology Society of India, is a premier academic journal dedicated to the field of metrology, encompassing a diverse range of topics within physics and astronomy. With an ISSN of 0970-3950 and an E-ISSN of 0974-9853, this journal has established a solid reputation since its inception in 2009, converging into contemporary insights and practices through 2024. Achieving a commendable Q3 ranking in the 2023 Scopus categories, it sits confidently within the field's landscape, ranked 40 out of 81 and placing within the 51st percentile. Despite its accessible nature, the journal does not currently offer open access. MAPAN aims to disseminate cutting-edge research and innovations in metrology, supporting a vibrant community of researchers, professionals, and students striving to explore the precise measurements and standards crucial for advancements in science and technology. As it continues to foster scholarly exchange, MAPAN plays a significant role in elevating metrology research and influencing its application within various scientific disciplines.

Metrology and Measurement Systems is a distinguished open-access journal dedicated to the advancement of knowledge in the field of metrology, instrumentation, and the engineering disciplines that encompass control systems. Published by the esteemed Polska Akademia Nauk (Polish Academy of Sciences), this journal serves as a vital resource for researchers, professionals, and students striving to address the complexities of measurement systems and the intricacies of control engineering. With an ISSN of 0860-8229 and an E-ISSN of 2300-1941, Metrology and Measurement Systems has been an open-access publication since 2010, broadening the reach of cutting-edge research to a global audience. The journal is categorized in the Q4 quartile for both Control and Systems Engineering and Instrumentation as of 2023, indicative of its growing platform for high-quality scholarly discourse. Its Scopus rankings reveal its relevance in the community, with its contributions becoming increasingly significant despite the current rankings of 209/321 and 106/141 in their respective categories. As it converges into the future, culminating in a timeline from 2008 to 2024, the journal remains committed to enhancing the essential dialogue surrounding measurement systems and fostering innovations in the field.

IEEE Instrumentation & Measurement Magazine, published by the esteemed IEEE - Institute of Electrical and Electronics Engineers Inc, is a leading source for advancements in the fields of electrical and electronic engineering, as well as instrumentation. With a well-established history from 1998 to 2024, this quarterly journal holds a significant position in the Q2 category for both Electrical and Electronic Engineering and Instrumentation, reflecting its impact and relevance in these fields. Its current ranking within Scopus demonstrates its recognition, being positioned in the 60th percentile among its peers. Although this journal does not offer Open Access options, it is recognized for providing in-depth articles and research findings that cater to the needs of researchers, professionals, and students alike. The magazine serves as an essential platform for disseminating knowledge, discussing emerging technologies, and facilitating communication among experts passionate about instrumentation and measurement. Join the community of innovators influencing the future of technology through the insightful content housed within this publication.